文章基本信息

标题：Effects of Annealing on TiN Thin Film Growth by DC Magnetron Sputtering
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作者：Azadeh Jafari ; Z. Ghoranneviss ; A. Salar Elahi 等
期刊名称：Advances in Mechanical Engineering
印刷版ISSN：1687-8140
电子版ISSN：1687-8140
出版年度：2014
卷号：2014
DOI：10.1155/2014/373847
出版社：Sage Publications Ltd.
摘要：We have reviewed the deposition of titanium nitride (TiN) thin films on stainless steel substrates by a DC magnetron sputtering method and annealing at different annealing temperatures of 500, 600, and 700°C for 120 min in nitrogen/argon atmospheres. Effects of annealing temperatures on the structural and the optical properties of TiN films were investigated using X-ray diffraction (XRD), atomic force microscope (AFM), field emission scanning electron microscopy (FESEM), and UV-VIS spectrophotometer. Our experimental studies reveal that the annealing temperature appreciably affected the structures, crystallite sizes, and reflection of the films. By increasing the annealing temperature to 700°C crystallinity and reflection of the film increase. These results suggest that annealed TiN films can be good candidate for tokamak first wall due to their structural and optical properties.