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  • 标题:Effect of Carbon Concentration on the Sputtering of Carbon-Rich SiC Bombarded by Helium Ions
  • 本地全文:下载
  • 作者:Xinghao Liang ; Yang Li ; Qiang Zhao
  • 期刊名称:Computation
  • 电子版ISSN:2079-3197
  • 出版年度:2018
  • 卷号:6
  • 期号:1
  • 页码:19-28
  • DOI:10.3390/computation6010019
  • 出版社:MDPI Publishing
  • 摘要:Silicon carbide (SiC) is considered as an important material for nuclear engineering due to its excellent properties. Changing the carbon content in SiC can regulate and control its elastic and thermodynamic properties, but a simulation study of the effect of carbon content on the sputtering (caused by the helium ions) of SiC is still lacking. In this work, we used the Monte-Carlo and molecular dynamics simulation methods to study the effects of carbon concentration, incidence energy, incident angle, and target temperature on the sputtering yield of SiC. The results show that the incident ions’ energy and angle have a significant effect on sputtering yield of SiC when the carbon concentration in SiC is around 62 at %, while the target temperature has a little effect on the sputtering yield of SiC. Our work might provide theoretical support for the experimental research and engineering application of carbon fiber-reinforced SiC that be used as the plasma-facing material in tokamak fusion reactors.
  • 关键词:plasma-facing material; silicon carbide; sputtering; molecular dynamics simulation plasma-facing material ; silicon carbide ; sputtering ; molecular dynamics simulation
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