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  • 标题:Induction of Repair Capacity for Oxidatively Damaged DNA as a Component of Peroxide Stress Response in Escherichia coli.
  • 本地全文:下载
  • 作者:QIU-MEI ZHANG ; TADASHI TAKEMOTO ; SEIJI MITO
  • 期刊名称:Journal of Radiation Research
  • 印刷版ISSN:0449-3060
  • 电子版ISSN:1349-9157
  • 出版年度:1996
  • 卷号:37
  • 期号:3
  • 页码:171-176
  • DOI:10.1269/jrr.37.171
  • 摘要:We examined whether or not peroxide stress induces a repair capacity for oxidatively damaged DNA in Escherichia coli cells. Peroxide stress was brought about by adding 30 μM hydrogen peroxide (H 2 O 2 ) to exponentially growing cells. The following results were obtained. (1) After exposure to H 2 O 2 , E. coli resistance to X-rays was enhanced. The acquisition of resistance was inhibited by rifampicin and chloramphenicol. (2) The response was acquired in mutants defective in the katG and oxyR genes, as well as in the wild-type strain. (3) Lambda phages damaged by exposure to H 2 O 2 showed higher survival on H 2 O 2 -treated cells than on untreated cells. (4) The peroxide stress did not render E. coli cells resistant to UV and mitomycin C. These suggest that peroxide stress induces a repair capacity against oxidative DNA damage and that this response must be regulated by a different mechanism from oxyR -mediated regulatory system.
  • 关键词:Escherichia coli; Peroxide stress; Induction of repair activity; X-ray sensitivity; Host cell reactivation
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