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  • 标题:Design and fabrication of high-performance diamond triple-gate field-effect transistors
  • 本地全文:下载
  • 作者:Jiangwei Liu ; Hirotaka Ohsato ; Xi Wang
  • 期刊名称:Scientific Reports
  • 电子版ISSN:2045-2322
  • 出版年度:2016
  • 卷号:6
  • 期号:1
  • DOI:10.1038/srep34757
  • 语种:English
  • 出版社:Springer Nature
  • 摘要:The lack of large-area single-crystal diamond wafers has led us to downscale diamond electronic devices. Here, we design and fabricate a hydrogenated diamond (H-diamond) triple-gate metal-oxide-semiconductor field-effect transistor (MOSFET) to extend device downscaling and increase device output current. The device's electrical properties are compared with those of planar-type MOSFETs, which are fabricated simultaneously on the same substrate. The triple-gate MOSFET's output current (174.2 mA mm(-1)) is much higher than that of the planar-type device (45.2 mA mm(-1)), and the on/off ratio and subthreshold swing are more than 10(8) and as low as 110 mV dec(-1), respectively. The fabrication of these H-diamond triple-gate MOSFETs will drive diamond electronic device development forward towards practical applications.
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