文章基本信息

标题：Patent Statistics for Technology Analysis
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作者：Sunghae Jun
期刊名称：International Journal of Software Engineering and Its Applications
印刷版ISSN：1738-9984
出版年度：2015
卷号：9
期号：5
页码：155-164
DOI：10.14257/ijseia.2015.9.5.15
出版社：SERSC
摘要：Technology analysis is to analyze technology by qualitative and quantitative approaches. This is important issue in management of technology (MOT) because the result of technology analysis is used for efficient R&D planning. In this paper, we propose novel approach to technology analysis by patent statistics. We retrieve patent documents related to target technology, and analyze the retrieved patent data by statistical methods such as visualization and modeling. To verify the performance of our research, we perform a case study using patent data for target domain. Our study contributes to R&D planning, new product development, and technological innovation.
关键词：Patent document; Patent analysis; Technology analysis; Patent statistics