文章基本信息

标题：A New Similarity Measure Based on Intraclass Statistics for Biometric Systems
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作者：Lee, Kwan-Yong ; Park, Hye-Young
期刊名称：ETRI Journal
印刷版ISSN：1225-6463
电子版ISSN：2233-7326
出版年度：2003
卷号：25
期号：5
页码：401-401
语种：English
出版社：Electronics and Telecommunications Research Institute
摘要：A biometric system determines the identity of a person by measuring physical features that can distinguish that person from others. Since biometric features have many variations and can be easily corrupted by noises and deformations, it is necessary to apply machine learning techniques to treat the data. When applying the conventional machine learning methods in designing a specific biometric system, however, one first runs into the difficulty of collecting sufficient data for each person to be registered to the system. In addition, there can be an almost infinite number of variations of non-registered data. Therefore, it is difficult to analyze and predict the distributional properties of real data that are essential for the system to deal with in practical applications. These difficulties require a new framework of identification and verification that is appropriate and efficient for the specific situations of biometric systems. As a preliminary solution, this paper proposes a simple but theoretically well-defined method based on a statistical test theory. Our computational experiments on real-world data show that the proposed method has potential for coping with the actual difficulties in biometrics.
关键词：Biometrics;statistical verification;Chi-square distribution;statistical test theory;similarity measure