文章基本信息

标题：Novel Patterning of Gold Using Spin-Coatable Gold Electron-Beam Resist
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作者：Kim, Ki-Chul ; Lee, Im-Bok ; Kang, Dae-Joon 等
期刊名称：ETRI Journal
印刷版ISSN：1225-6463
电子版ISSN：2233-7326
出版年度：2007
卷号：29
期号：6
页码：814-816
语种：English
出版社：Electronics and Telecommunications Research Institute
摘要：Conventional lithography methods of gold patterning are based on deposition and lift-off or deposition and etching. In this letter, we demonstrate a novel method of gold patterning using spin-coatable gold electron-beam resist which is functionalized gold nanocrystals with amine ligands. Amine-stabilized gold electron beam resist exhibits good sensitivity, 3.0 mC/ , compared to that of thiol-stabilized gold electron beam resists. The proposed method reduces the number of processing steps and provides greater freedom in the patterning of complex nanostructures.
关键词：Patterning method;gold electron-beam resist;functionalized gold nanocrystals