文章基本信息

标题：A Study of Technology Trends Analysis Using Patent Search Systems
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作者：Shigeyuki Haruyama ; Kenji Miyake ; Tomohisa Kimura 等
期刊名称：Journal on Innovation and Sustainability. RISUS ISSN 2179-3565
印刷版ISSN：2179-3565
出版年度：2014
卷号：5
期号：2
页码：18-35
语种：English
出版社：RISUS. Revista de Innovación y Sustentabilidad ISSN 2179-3565
摘要：Patent information is effective in clarifying the research policy and strategy of acompany and its competitors through the analysis of technological trends. In this study, wedevised a patent analysis system that incorporates one patent search system, YUPASS (YamaguchiUniversity Patent Search System), and patent mapping software. In order to confirm theeffectiveness of this analysis system, we focused on the differences in technological features ofexposure equipment of Canon, Nikon and ASML for use in semiconductor manufacturing andtheir market share, and attempted to infer the technological reason for the changes in eachcompany’s market share through the analysis of patent maps. The analysis result correlatedwell with the market share investigation report, and we have found that it is a useful analyticaltool in clarifying a company’s or its competitor’s research strategy and policy.
关键词：Patent information, patent map, IPC, FI, F term, semiconductor, exposure equipment