出版社:The Society of Photographic Science and Technolgy of Japan
摘要:The influence of exposure level variations on developed silver obtained by monobath-processing were investigated. Experiments performed with P-Q monobaths containing thiocyanate and thiosulf ate as fixing agents, using a high-speed negative film, indicate that the grain structure of developed silver at lower exposure level are larger and more compact than that at higher exposure level. When compared with corresponding nonfixing developer at equal exposure levels, such monobaths tend to produce considerably more silver and faster development rate at lower exposure level, but this tendency is entirely reversed at higher exposure level. These appear to be the result of solution-physical development of silver complex dissolved from unexposed grains upon adjacent exposed and partially developed grains. The lower the exposure, the more unexposed grains are available for attack by fixing agents and the smaller is the number of exposed grain available for the deposition of the silver from the solution.