文章基本信息

标题：Key technologies and international trends in EDA field of digital IC design: a patent analysis
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作者：Weihui Li ; Haoyu Wen ; Peiji Duan 等
期刊名称：SHS Web of Conferences
印刷版ISSN：2416-5182
电子版ISSN：2261-2424
出版年度：2022
卷号：140
页码：1-5
DOI：10.1051/shsconf/202214001020
语种：English
出版社：EDP Sciences
摘要：Currently, Electronics Design Automation (EDA) software tools are highly monopolized internationally. In China, EDA suffers from the pain of “stuck neck”. This paper will find out the key technologies in the EDA field through 3D sand table clustering algorithm, and analyze a series of patent data of monopoly three companies (Synopsys, Cadence, Mentor Graphic), in order to help local EDA enterprises perceive the technology status and development trend of the international EDA field.