文章基本信息

标题：Application of PhotoStress Method in the Analysis of Stress Fields Around a Notch
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作者：Peter Frankovský ; Pavol Zubko ; Oskar Ostertag 等
期刊名称：American Journal of Mechanical Engineering
印刷版ISSN：2328-4102
电子版ISSN：2328-4110
出版年度：2013
卷号：1
期号：7
页码：329-334
DOI：10.12691/ajme-1-7-35
语种：English
出版社：Science and Education Publishing
摘要：The presented paper aims at the analysis of stress fields which occur while applying loads to a photoelastically coated notched sample. The analysis was done by means of PhotoStress^® method using reflection polariscope and digital video camera. On the notched sample subject to loads by eccentric tension we determined the differences of principal normal stresses in specified point at loads 3 kN, 4.5 kN, 6 kN, 9 kN and 12 kN. In addition, we determined the value of principal normal stress at the edge of the sample during load of 12 kN which was later compared with numerical solution in programme SolidWorks. On the photo elastically coated sample we observed maximum elongation of the coating, too. As regards maximum elongation of applied photoelastic coating PS-1A, the manufacturer states the value of 5%.
关键词：notch; stress field; photoelastic coating; PhotoStress^® method