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  • 标题:Remarkable plasma-resistance performance by nanocrystalline Y 2O 3·MgO composite ceramics for semiconductor industry applications
  • 本地全文:下载
  • 作者:Hyeon-Myeong Oh ; Young-Jo Park ; Ha-Neul Kim
  • 期刊名称:Scientific Reports
  • 电子版ISSN:2045-2322
  • 出版年度:2021
  • 卷号:11
  • DOI:10.1038/s41598-021-89664-9
  • 语种:English
  • 出版社:Springer Nature
  • 摘要:Motivated by recent finding of crystallographic-orientation-dependent etching behavior of sintered ceramics, the plasma resistance of nanocrystalline Y 2O 3-MgO composite ceramics (YM) was evaluated for the first time. We report a remarkably high plasma etching resistance of nanostructure YM surpassing the plasma resistance of commercially used transparent Y 2O 3 and MgAl 2O 4 ceramics. The pore-free YM ceramic with grain sizes of several hundred nm was fabricated by hot press sintering, enabling theoretical maximum densification at low temperature. The insoluble two components effectively suppressed the grain growth by mutual pinning. The engineering implication of the developed YM nanocomposite imparts enhanced mechanical reliability, better cost effectiveness with excellent plasma resistance property over their counterparts in plasma using semiconductor applications.
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