文章基本信息

标题：Experimental Scanning Laser Lithography with Exposure Optimization
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作者：Andrew J. Fleming ; Omid T. Ghalehbeygi ; Ben S. Routley 等
期刊名称：IFAC PapersOnLine
印刷版ISSN：2405-8963
出版年度：2017
卷号：50
期号：1
页码：8662-8667
DOI：10.1016/j.ifacol.2017.08.1524
语种：English
出版社：Elsevier
摘要：AbstractLaser scanning lithography is a maskless method for exposing films of photoresist during semiconductor manufacturing. In this method a focused beam is scanned over a surface with varying intensity to create features in the photoresist. Given the shape of a desired feature, an exposure pattern must be found that approximates this shape in the developed photoresist. This can be cast as an optimization problem, which is complicated by the non-negative nature of the exposure function and the non-linear photochemistry of the film. In this article, a nonlinear programming approach is described that results in a tractable optimization problem which accounts for all of the practical constraints encountered in laser scanning lithography. This method is demonstrated to create a sub-wavelength feature which is verified by optical finite element simulation with a resolution of 20 nm.